fig5

<i>In situ</i> study of phase transition in HZO ferroelectric thin films via TEM electron beam irradiation

Figure 5. Electron beam irradiation-induced crystallization of amorphous HZO thin film: (A) nucleation begins in the o-phase, (B) growth of the o-phase nucleus, (C) growth of the nucleus in both the o-phase and m-phase, (D) complete crystallization of the amorphous HZO thin film, (E) generation of lattice dislocations at the interface, (F) rotation of the o-phase crystal axis. The scale bars are all 10 nm.

Microstructures
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