fig2
From: In situ study of phase transition in HZO ferroelectric thin films via TEM electron beam irradiation
Figure 2. (A) HRTEM image of the cross-sectional morphology of the HZO ferroelectric capacitor, (B) Schematic diagram of electron beam irradiation, scale bar 5 nm, (C) Semi-quantitative analysis of VO concentration before and after electron beam irradiation of the TiN/HZO/TiN ferroelectric thin film, (D) EDX element mapping of the TiN/HZO/TiN ferroelectric thin film before electron beam irradiation, scale bar 10 nm, (E) EDX element mapping of the TiN//HZO/TiN ferroelectric thin film after electron beam irradiation, scale bar 10 nm.
