fig1
From: In situ study of phase transition in HZO ferroelectric thin films via TEM electron beam irradiation
Figure 1. (A) Fabrication process of HZO ferroelectric capacitor, (B) Structural models of a non-polar t-phase with space group P42/nmc and a polar o-phase with space group Pca21. (C) GI-XRD pattern of W/HZO/W ferroelectric thin film, (D) P-V and I-V curves of HZO ferroelectric thin film.
