fig6

Transparent <i>p</i>-type copper iodide for next-generation electronics: fundamental physics and recent research trends

Figure 6. (A) (left) Fabrication method for sulfur-doped iodination, including photographs of the Cu and CuI thin films. (right) DFT calculation of doping formation energy and doping concentration of sulfur during vapor and liquid iodination[28]. Copyright 2022 American Chemical Society; (B) Hole carrier concentration and mobility of selenium-doped CuI films[109]. Copyright 2021 John Wiley & Sons, Inc; (C) Defect complex structure of Cs-doped CuI thin film[110]. Copyright 2022 American Chemical Society. CuI: Copper iodide; DFT: density functional theory.

Soft Science
ISSN 2769-5441 (Online)
Follow Us

Portico

All published articles are preserved here permanently:

https://www.portico.org/publishers/oae/

Portico

All published articles are preserved here permanently:

https://www.portico.org/publishers/oae/