fig1
From: Direct fabrication of high-performance multi-response e-skin based on a graphene nanosheet film
Figure 1. ECR system and overall manufacturing process of F-GNEC film sensor. (A) Schematic diagram of F-GNEC film prepared by ECR sputtering system, where the purple, gray and blue dots represent argon ions, carbon atoms and electrons, respectively. (B) Schematic diagram of F-GNEC-based e-skin and the specific structure design with the detection area divided as the finger structure so that the e-skin can realize multi-response detection and avoid interference. (C) Fabrication process of F-GNEC film-based e-skin, where the direct film preparation can effectively reduce defects and the simple and reliable preparation process is convenient for batch fabrication.
