fig6
![Crosslinked organosulfur-based self-assembled monolayers: formation and applications](https://image.oaes.cc/d6dc0fa2-49ad-4317-995a-f186315f65ae/4849.fig.6.jpg)
Figure 6. SEM image of lines with a width of: (A) 100 nm, (B) 10 nm prepared using a BPT SAM negative resist. Reprinted with permission from Ref.[45], copyright 2000 AVS. BPT: Biphenyl-4-thiol; SAM: self-assembled monolayer.
Figure 6. SEM image of lines with a width of: (A) 100 nm, (B) 10 nm prepared using a BPT SAM negative resist. Reprinted with permission from Ref.[45], copyright 2000 AVS. BPT: Biphenyl-4-thiol; SAM: self-assembled monolayer.
All published articles are preserved here permanently:
https://www.portico.org/publishers/oae/