fig2

Automated production of batched unclonable micro-patterns anti-counterfeiting labels with strong robustness and rapid recognition speed

Figure 2. (A-D) The fluorescence image of the generated micro-patterns film at 17, 38, 73, and 128 mW etching power (There is no obvious change in the etching area at 7 mW). The scale bar is 100 µm; (E) SEM images of a perovskite quantum dot film after etching micropatterns. The scale bar is 100 µm; (F) SEM images of etching lines of micropatterns. The scale bar is 20 µm; (G) SEM images of part of film. (G1) is the enlarged view of the non-etched area, (G2) is the enlarged view of the etched area. SEM: Scanning electron microscope.

Journal of Materials Informatics
ISSN 2770-372X (Online)
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