fig15

Figure 15. Schematic side view of experimental setup of in-situ TEM heating stage (A). Evolution of SAED patterns across a wide temperature range (B_1-4): 25 °C (B₁); 400 °C (B₂); 780 °C (B₃); 900 °C (B₄). TEM images showing the size of 2D MoS₂ increasing with increasing temperatures (C_1-4): 800 °C (C₁); 820 °C (C₂); 840 °C (C₃); 850 °C (C₄). Statistical distribution of 2D MoS₂ size as a function of heating temperature from c_1-4 (D₁). Raman spectra of silicone chip, (NH₄)₂MoS₄ precursor and as-grown MoS₂ (D₂)^[69].