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![Self-terminated electrodeposition of Pt group metal: principles, synthetic strategies, and applications](https://image.oaes.cc/7eb96f31-c86c-4375-a25a-29a656950b6c/em4065.fig.1.jpg)
Figure 1. (A) Gravimetric and (B and C) voltammetric assessments of Pt deposition from 3 mM Pt K2PtCl4 and 0.5 M NaCl using either a static EQCM or an RDE (400 rpm). The insets are optical images of Pt films grown on Au-coated Si(100) wafers for 500 s at the indicated potentials. (D) Evolution of Pt film thickness, derived from XPS analysis, in relation to deposition time at -0.8 VSSCE on Au-coated Si(100) wafers, obtained from a pH 4 solution. (E) Mass change accompanying each potential pulse. (F) Pt thickness obtained by XPS and EQCM results as a function of Pt deposition pulse number. This figure is quoted with permission from Liu et al.[44].